Wafer‐fused 1300 nm VCSELs with an active region based on superlattice
Abstract The 1300 nm range vertical‐cavity surface‐emitting lasers with the active region based on InGaAs/InGaAlAs superlattice are fabricated using molecular‐beam epitaxy and the double wafer‐fusion technique. Lasers with the buried tunnel junction diameter of 5 μm have shown single‐mode CW operati...
Main Authors: | , , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Wiley
2021-08-01
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Series: | Electronics Letters |
Online Access: | https://doi.org/10.1049/ell2.12232 |