XPS Analysis of 2- and 3-Aminothiophenol Grafted on Silicon (111) Hydride Surfaces

• Main Authors: Chieh-Hua Lee, Wan-Cian Chen, Yit Lung Khung
• Format: Article
• Language: English
• Published: MDPI AG 2018-10-01
• Series: Molecules
• Subjects: aminothiophenol; resonance effect; surface modification; nucleophilic addition; silicon (111) hydride
• Online Access: http://www.mdpi.com/1420-3049/23/10/2712

Following on from our previous study on the resonance/inductive structures of ethynylaniline, this report examines similar effects arising from resonance structures with aromatic aminothiophenol with dual electron-donating substituents. In brief, 2- and 3-aminothiophenol were thermally grafted on silicon (111) hydride substrate at 130 °C under nonpolar aprotic mesitylene. From the examination of high resolution XPS Si2p, N1s, and S2p spectrum, it was noticed that there was a strong preference of NH2 over SH to form Si–N linkage on the silicon hydride surface for 2-aminothiophenol. However, for 3-aminothiophenol, there was a switch in reactivity of the silicon hydride toward SH group. This was attributed to the antagonistic and cooperative resonance effects for 2- and 3-aminothiophenol, respectively. The data strongly suggested that the net resonance of the benzylic-based compound could have played an important role in the net distribution of negative charge along the benzylic framework and subsequently influenced the outcome of the surface reaction. To the best of the authors’ knowledge, this correlation between dual electron-donating substituents and the outcome of the nucleophilic addition toward silicon hydride surfaces has not been described before in literature.