| Summary: | We report a numerical investigation of the breakdown and damage in fused silica caused by ultra-short laser pulses. The study based on a modified model (Gaabour et al., 2012) that solves the rate equation numerically for the electron density evolution during the laser pulse, under the combined effect of both multiphoton and electron impact ionization processes. Besides, electron loss processes due to diffusion out of the focal volume and recombination are also considered in this analysis. The model is applied to investigate the threshold intensity dependence on laser pulse width in the experimental measurements that are given by Liu et al. (2005). In this experiment, a Ti-sapphire laser source operating at 800 nm with pulse duration varies between 240 fs and 2.5 ps is used to irradiate a bulk of fused silica with dimensions 10 × 5 × 3 mm. The laser beam was focused into the bulk using two optical systems with effective numerical apertures (NA) 0.126 and 0.255 to give beam spot radius at the focus of the order 2.0 μm and 0.95 μm respectively. Reasonable agreement between the calculated thresholds and the measured ones is attained. Moreover, a study is performed to examine the respective role of the physical processes of the breakdown of fused silica in relation to the pulse width and focusing optical system. The analysis revealed a real picture of the location and size of the generated plasma. Keywords: Ultra-short laser pulses, Ablation mechanisms, Electron density, Electron loss processes, Avalanche ionization, Breakdown threshold
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