Figuring of optical aluminium devices by reactive ion beam etching
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g. Al6061)fails, since the surface roughness increases drastically as a result of inhomogeneous etching due to structural, crystallographic...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2019-01-01
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| Series: | EPJ Web of Conferences |
| Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2019/20/epjconf_eos18_06002.pdf |
| Summary: | Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g. Al6061)fails, since the surface roughness increases drastically as a result of inhomogeneous etching due to structural, crystallographic and chemical irregularities inside the material matrix. As an alternative figuring technology reactive ion-beam etching (RIBE) is a promising route. RIBE provides the direct machining of Al alloys while preserving the surface roughness almostin its initial state. The RIBE process with nitrogengasis focused more detailedin this study. |
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| ISSN: | 2100-014X |