Patterning solution-processed organic single-crystal transistors with high device performance

• Main Authors: Yun Li, Chuan Liu, Akichika Kumatani, Peter Darmawan, Takeo Minari, Kazuhito Tsukagoshi
• Format: Article
• Language: English
• Published: AIP Publishing LLC 2011-06-01
• Series: AIP Advances
• Online Access: http://dx.doi.org/10.1063/1.3608793

We report on the patterning of organic single-crystal transistors with high device performance fabricated via a solution process under ambient conditions. The semiconductor was patterned on substrates via surface selective deposition. Subsequently, solvent-vapor annealing was performed to reorganize the semiconductor into single crystals. The transistors exhibited field-effect mobility (μFET) of up to 3.5 cm2/V s. Good reliability under bias-stress conditions indicates low density of intrinsic defects in crystals and low density of traps at the active interfaces. Furthermore, the Y function method clearly suggests that the variation of μFET of organic crystal transistors was caused by contact resistance. Further improvement of the device with higher μFET with smaller variation can be expected when lower and more uniform contact resistance is achieved.