Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy

Nanocrystalline GaSb films were grown on Si(001) from the stoichiometric Ga⁻Sb mixture using solid-phase epitaxy at temperatures of 200⁻500 °C. Use of the solid-phase epitaxy method allowed the suppression of Ga surface diffusion and prevention of intense Sb desorption....

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Main Authors: Evgeniy Chusovitin, Sergey Dotsenko, Svetlana Chusovitina, Dmitry Goroshko, Anton Gutakovskii, Evgeniy Subbotin, Konstantin Galkin, Nikolay Galkin
Format: Article
Language:English
Published: MDPI AG 2018-11-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/8/12/987
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language English
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author Evgeniy Chusovitin
Sergey Dotsenko
Svetlana Chusovitina
Dmitry Goroshko
Anton Gutakovskii
Evgeniy Subbotin
Konstantin Galkin
Nikolay Galkin
spellingShingle Evgeniy Chusovitin
Sergey Dotsenko
Svetlana Chusovitina
Dmitry Goroshko
Anton Gutakovskii
Evgeniy Subbotin
Konstantin Galkin
Nikolay Galkin
Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
Nanomaterials
solid phase epitaxy
crystal structure
epitaxial relationships
GaSb
Si(001)
author_facet Evgeniy Chusovitin
Sergey Dotsenko
Svetlana Chusovitina
Dmitry Goroshko
Anton Gutakovskii
Evgeniy Subbotin
Konstantin Galkin
Nikolay Galkin
author_sort Evgeniy Chusovitin
title Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
title_short Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
title_full Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
title_fullStr Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
title_full_unstemmed Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase Epitaxy
title_sort formation of a thin continuous gasb film on si(001) by solid phase epitaxy
publisher MDPI AG
series Nanomaterials
issn 2079-4991
publishDate 2018-11-01
description Nanocrystalline GaSb films were grown on Si(001) from the stoichiometric Ga&#8315;Sb mixture using solid-phase epitaxy at temperatures of 200&#8315;500 &#176;C. Use of the solid-phase epitaxy method allowed the suppression of Ga surface diffusion and prevention of intense Sb desorption. At the annealing temperature of 300 &#176;C, a 14-nm-thick GaSb film aggregates, while a 20-nm-thick GaSb film remains continuous with a roughness of 1.74 nm. A GaSb film with a thickness of 20 nm consists of crystalline grains with a size of 9&#8315;16 nm. They were compressed by ~2%. For some GaSb grains, new epitaxial relationships have been found: GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>111</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>2</mn> <mo>&#175;</mo> </mover> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>, GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>113</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>, and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>002</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>.
topic solid phase epitaxy
crystal structure
epitaxial relationships
GaSb
Si(001)
url https://www.mdpi.com/2079-4991/8/12/987
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spelling doaj-2cef1e882fe148aca4a4d86a4dc6e8d32020-11-25T00:37:13ZengMDPI AGNanomaterials2079-49912018-11-0181298710.3390/nano8120987nano8120987Formation of a Thin Continuous GaSb Film on Si(001) by Solid Phase EpitaxyEvgeniy Chusovitin0Sergey Dotsenko1Svetlana Chusovitina2Dmitry Goroshko3Anton Gutakovskii4Evgeniy Subbotin5Konstantin Galkin6Nikolay Galkin7Institute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaRzhanov Institute of Semiconductor Physics SB RAS, 13 Lavrentieva Ave., 630090 Novosibirsk, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaInstitute of Automation and Control Processes FEB RAS, 5 Radio St., 690041 Vladivostok, RussiaNanocrystalline GaSb films were grown on Si(001) from the stoichiometric Ga&#8315;Sb mixture using solid-phase epitaxy at temperatures of 200&#8315;500 &#176;C. Use of the solid-phase epitaxy method allowed the suppression of Ga surface diffusion and prevention of intense Sb desorption. At the annealing temperature of 300 &#176;C, a 14-nm-thick GaSb film aggregates, while a 20-nm-thick GaSb film remains continuous with a roughness of 1.74 nm. A GaSb film with a thickness of 20 nm consists of crystalline grains with a size of 9&#8315;16 nm. They were compressed by ~2%. For some GaSb grains, new epitaxial relationships have been found: GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>111</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>2</mn> <mo>&#175;</mo> </mover> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>, GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>113</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>, and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>11</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>(</mo> <mrow> <mn>002</mn> </mrow> <mo>)</mo> </mrow> </mrow> </semantics> </math> </inline-formula> and GaSb<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>||Si<inline-formula> <math display="inline"> <semantics> <mrow> <mrow> <mo>[</mo> <mrow> <mn>1</mn> <mover accent="true"> <mn>1</mn> <mo>&#175;</mo> </mover> <mn>0</mn> </mrow> <mo>]</mo> </mrow> </mrow> </semantics> </math> </inline-formula>.https://www.mdpi.com/2079-4991/8/12/987solid phase epitaxycrystal structureepitaxial relationshipsGaSbSi(001)