Fabrication of ultrahigh-density nanowires by electrochemical nanolithography
<p>Abstract</p> <p>An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 10<sup>11 </sup>cm<sup>-2 </sup>with g...
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2011-01-01
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Series: | Nanoscale Research Letters |
Online Access: | http://www.nanoscalereslett.com/content/6/1/444 |
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doaj-2c86e3f017b24ff68cf0f92d4a0adc1f2020-11-24T21:52:39ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2011-01-0161444Fabrication of ultrahigh-density nanowires by electrochemical nanolithographyJiang HongquanKiefer ArnoldClausen AnnaTing Yuk-HongWendt AmyLagally MaxChen FengDing Bingjun<p>Abstract</p> <p>An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 10<sup>11 </sup>cm<sup>-2 </sup>with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.</p> http://www.nanoscalereslett.com/content/6/1/444 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Jiang Hongquan Kiefer Arnold Clausen Anna Ting Yuk-Hong Wendt Amy Lagally Max Chen Feng Ding Bingjun |
spellingShingle |
Jiang Hongquan Kiefer Arnold Clausen Anna Ting Yuk-Hong Wendt Amy Lagally Max Chen Feng Ding Bingjun Fabrication of ultrahigh-density nanowires by electrochemical nanolithography Nanoscale Research Letters |
author_facet |
Jiang Hongquan Kiefer Arnold Clausen Anna Ting Yuk-Hong Wendt Amy Lagally Max Chen Feng Ding Bingjun |
author_sort |
Jiang Hongquan |
title |
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
title_short |
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
title_full |
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
title_fullStr |
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
title_full_unstemmed |
Fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
title_sort |
fabrication of ultrahigh-density nanowires by electrochemical nanolithography |
publisher |
SpringerOpen |
series |
Nanoscale Research Letters |
issn |
1931-7573 1556-276X |
publishDate |
2011-01-01 |
description |
<p>Abstract</p> <p>An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 10<sup>11 </sup>cm<sup>-2 </sup>with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.</p> |
url |
http://www.nanoscalereslett.com/content/6/1/444 |
work_keys_str_mv |
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1725875531509923840 |