Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition

Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on the characteristics of atomic layer depositio...

Full description

Bibliographic Details
Main Authors: Lei Qu, Rui Chen, Xiaoting Li, Jing Zhang, Yanrong Wang, Shuhua Wei, Jiang Yan, Yayi Wei
Format: Article
Language:English
Published: JommPublish 2019-06-01
Series:Journal of Microelectronic Manufacturing
Subjects:
thin film deposition
atomic layer deposition
growth model
prediction model
simulation method
Online Access:http://www.jommpublish.org/p/30/#

Similar Items

Similar Items