Free-standing silicon shadow masks for transmon qubit fabrication

Nanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks fabricated from silicon-on-insulator wafers. These silicon shadow...

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Main Authors:	I. Tsioutsios, K. Serniak, S. Diamond, V. V. Sivak, Z. Wang, S. Shankar, L. Frunzio, R. J. Schoelkopf, M. H. Devoret
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2020-06-01
Series:	AIP Advances
Online Access:	http://dx.doi.org/10.1063/1.5138953

id	doaj-25a1d35a86cc4d03b40a567acac980e7
record_format	Article
spelling	doaj-25a1d35a86cc4d03b40a567acac980e72020-11-25T03:15:02ZengAIP Publishing LLCAIP Advances2158-32262020-06-01106065120065120-610.1063/1.5138953Free-standing silicon shadow masks for transmon qubit fabricationI. Tsioutsios0K. Serniak1S. Diamond2V. V. Sivak3Z. Wang4S. Shankar5L. Frunzio6R. J. Schoelkopf7M. H. Devoret8Department of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USADepartment of Applied Physics, Yale University, New Haven, Connecticut 06520, USANanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks fabricated from silicon-on-insulator wafers. These silicon shadow masks not only eliminate organic residues associated with resist-based lithography, but also provide a pathway to better understand and control surface-dielectric losses in superconducting qubits by decoupling mask fabrication from substrate preparation. We have successfully fabricated aluminum 3D transmon superconducting qubits with these shadow masks and found coherence quality factors comparable to those fabricated with standard techniques.http://dx.doi.org/10.1063/1.5138953
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	I. Tsioutsios K. Serniak S. Diamond V. V. Sivak Z. Wang S. Shankar L. Frunzio R. J. Schoelkopf M. H. Devoret
spellingShingle	I. Tsioutsios K. Serniak S. Diamond V. V. Sivak Z. Wang S. Shankar L. Frunzio R. J. Schoelkopf M. H. Devoret Free-standing silicon shadow masks for transmon qubit fabrication AIP Advances
author_facet	I. Tsioutsios K. Serniak S. Diamond V. V. Sivak Z. Wang S. Shankar L. Frunzio R. J. Schoelkopf M. H. Devoret
author_sort	I. Tsioutsios
title	Free-standing silicon shadow masks for transmon qubit fabrication
title_short	Free-standing silicon shadow masks for transmon qubit fabrication
title_full	Free-standing silicon shadow masks for transmon qubit fabrication
title_fullStr	Free-standing silicon shadow masks for transmon qubit fabrication
title_full_unstemmed	Free-standing silicon shadow masks for transmon qubit fabrication
title_sort	free-standing silicon shadow masks for transmon qubit fabrication
publisher	AIP Publishing LLC
series	AIP Advances
issn	2158-3226
publishDate	2020-06-01
description	Nanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks fabricated from silicon-on-insulator wafers. These silicon shadow masks not only eliminate organic residues associated with resist-based lithography, but also provide a pathway to better understand and control surface-dielectric losses in superconducting qubits by decoupling mask fabrication from substrate preparation. We have successfully fabricated aluminum 3D transmon superconducting qubits with these shadow masks and found coherence quality factors comparable to those fabricated with standard techniques.
url	http://dx.doi.org/10.1063/1.5138953
work_keys_str_mv	AT itsioutsios freestandingsiliconshadowmasksfortransmonqubitfabrication AT kserniak freestandingsiliconshadowmasksfortransmonqubitfabrication AT sdiamond freestandingsiliconshadowmasksfortransmonqubitfabrication AT vvsivak freestandingsiliconshadowmasksfortransmonqubitfabrication AT zwang freestandingsiliconshadowmasksfortransmonqubitfabrication AT sshankar freestandingsiliconshadowmasksfortransmonqubitfabrication AT lfrunzio freestandingsiliconshadowmasksfortransmonqubitfabrication AT rjschoelkopf freestandingsiliconshadowmasksfortransmonqubitfabrication AT mhdevoret freestandingsiliconshadowmasksfortransmonqubitfabrication
_version_	1724640954549272576

Free-standing silicon shadow masks for transmon qubit fabrication

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