Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering

Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas–solid paraequilibrium defining chemical composition and thus point defect concentration. We show that this notion allows for point...

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Main Authors:	Moritz to Baben, Marcus Hans, Daniel Primetzhofer, Simon Evertz, Holger Ruess, Jochen M. Schneider
Format:	Article
Language:	English
Published:	Taylor & Francis Group 2017-05-01
Series:	Materials Research Letters
Subjects:	TiAlN thin films hard coatings vacancies thermodynamics
Online Access:	http://dx.doi.org/10.1080/21663831.2016.1233914

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spelling	doaj-23e0592f7012477a8556e90f7f76d9db2020-11-25T00:15:37ZengTaylor & Francis GroupMaterials Research Letters2166-38312017-05-015315816910.1080/21663831.2016.12339141233914Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineeringMoritz to Baben0Marcus Hans1Daniel Primetzhofer2Simon Evertz3Holger Ruess4Jochen M. Schneider5RWTH Aachen UniversityRWTH Aachen UniversityUppsala UniversityRWTH Aachen UniversityRWTH Aachen UniversityRWTH Aachen UniversityExtreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas–solid paraequilibrium defining chemical composition and thus point defect concentration. We show that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti,Al)Nx, the industrial benchmark coating for wear protection, can be increased from 800°C to unprecedented 1200°C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films.http://dx.doi.org/10.1080/21663831.2016.1233914TiAlNthin filmshard coatingsvacanciesthermodynamics
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Moritz to Baben Marcus Hans Daniel Primetzhofer Simon Evertz Holger Ruess Jochen M. Schneider
spellingShingle	Moritz to Baben Marcus Hans Daniel Primetzhofer Simon Evertz Holger Ruess Jochen M. Schneider Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering Materials Research Letters TiAlN thin films hard coatings vacancies thermodynamics
author_facet	Moritz to Baben Marcus Hans Daniel Primetzhofer Simon Evertz Holger Ruess Jochen M. Schneider
author_sort	Moritz to Baben
title	Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
title_short	Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
title_full	Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
title_fullStr	Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
title_full_unstemmed	Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
title_sort	unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
publisher	Taylor & Francis Group
series	Materials Research Letters
issn	2166-3831
publishDate	2017-05-01
description	Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas–solid paraequilibrium defining chemical composition and thus point defect concentration. We show that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti,Al)Nx, the industrial benchmark coating for wear protection, can be increased from 800°C to unprecedented 1200°C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films.
topic	TiAlN thin films hard coatings vacancies thermodynamics
url	http://dx.doi.org/10.1080/21663831.2016.1233914
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Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering

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