| Summary: | Thin cobalt films were deposited by dc sputtering on Si(1 1 1) substrates. These films were annealed after deposition at different temperatures (Tan) in the range 550–800 °C. Surface morphology of the films was studied by SEM, which showed a smooth and continues film for Tan = 500 °C, while a granular structure was observed for higher Tan. Magnetic properties of these films were studied by SQUID magnetometer. We have investigated the annealing temperature dependence of coercivity and its correlation to film morphology. Coercive field shows a non-monotonic behaviour with Tan, while saturation magnetization shows no change. Further, the temperature dependence of coercivity for as deposited and annealed at 700 °C were measured and compared.
|
|---|
