Evolution of crystallographic structure and ferroelectricity of Hf0.5Zr0.5O2 films with different deposition rate
Hf0.5Zr0.5O2 films are one of the most attractive HfO2-based ferroelectric films because of good ferroelectricity, extreme thinness, and excellent compatibility with silicon devices. The origin of the ferroelectricity of Hf0.5Zr0.5O2 films is the noncentrosymmetric orthorhombic phase (space group Pc...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-01-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5121454 |