Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC ar...

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Bibliographic Details
Main Authors: Liliana Kotte, Jana Haag, Tobias Mertens, Stefan Kaskel
Format: Article
Language:English
Published: MDPI AG 2014-12-01
Series:Metals
Subjects:
SiO2 film
AP-PECVD
titanium alloy
adhesion layer
wedge test
Online Access:http://www.mdpi.com/2075-4701/4/4/639
Description
Summary:This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.
ISSN:2075-4701

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