Mesostructured HfO2/Al2O3 Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices

Mesostructured HfO2/Al2O3 Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices

Bibliographic Details
Main Authors:	Mohamed Barakat Zakaria, Takahiro Nagata, Toyohiro Chikyow
Format:	Article
Language:	English
Published:	American Chemical Society 2019-08-01
Series:	ACS Omega
Online Access:	http://dx.doi.org/10.1021/acsomega.9b01095

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