Mesostructured HfO2/Al2O3 Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
American Chemical Society
2019-08-01
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| Series: | ACS Omega |
| Online Access: | http://dx.doi.org/10.1021/acsomega.9b01095 |
| ISSN: | 2470-1343 |
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