Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating

Shear coating is a promising deposition method for upscaling device fabrication and enabling high throughput, and is furthermore suitable for translating to roll-to-roll processing. Although common polymer semiconductors (PSCs) are solution processible, they are still prone to mechanical failure upo...

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Main Authors: Kristina Ditte, Nataliya Kiriy, Jonathan Perez, Mike Hambsch, Stefan C. B. Mannsfeld, Yulia Krupskaya, Ramesh Maragani, Brigitte Voit, Franziska Lissel
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Polymers
Subjects:
Online Access:https://www.mdpi.com/2073-4360/13/9/1435
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spelling doaj-1f41d79031a04c00b4c56505379a1f8d2021-04-29T23:05:18ZengMDPI AGPolymers2073-43602021-04-01131435143510.3390/polym13091435Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear CoatingKristina Ditte0Nataliya Kiriy1Jonathan Perez2Mike Hambsch3Stefan C. B. Mannsfeld4Yulia Krupskaya5Ramesh Maragani6Brigitte Voit7Franziska Lissel8Leibniz-Institut für Polymerforschung Dresden e.V., Hohe Straße 6, 01069 Dresden, GermanyLeibniz-Institut für Polymerforschung Dresden e.V., Hohe Straße 6, 01069 Dresden, GermanyCenter for Advancing Electronics Dresden and Faculty of Electrical and Computer Engineering, Technische Universität Dresden, Helmholtzstraße 18, 01069 Dresden, GermanyCenter for Advancing Electronics Dresden and Faculty of Electrical and Computer Engineering, Technische Universität Dresden, Helmholtzstraße 18, 01069 Dresden, GermanyCenter for Advancing Electronics Dresden and Faculty of Electrical and Computer Engineering, Technische Universität Dresden, Helmholtzstraße 18, 01069 Dresden, GermanyLeibniz Institute for Solid State and Materials Research, Helmholtzstraße 20, 01069 Dresden, GermanyMartin-Luther-Universität Halle-Wittenberg, Naturwissenschaftliche Fakultät II, Von-Danckelmann-Platz 4, 06120 Halle, GermanyLeibniz-Institut für Polymerforschung Dresden e.V., Hohe Straße 6, 01069 Dresden, GermanyLeibniz-Institut für Polymerforschung Dresden e.V., Hohe Straße 6, 01069 Dresden, GermanyShear coating is a promising deposition method for upscaling device fabrication and enabling high throughput, and is furthermore suitable for translating to roll-to-roll processing. Although common polymer semiconductors (PSCs) are solution processible, they are still prone to mechanical failure upon stretching, limiting applications in e.g., electronic skin and health monitoring. Progress made towards mechanically compliant PSCs, e.g., the incorporation of soft segments into the polymer backbone, could not only allow such applications, but also benefit advanced fabrication methods, like roll-to-roll printing on flexible substrates, to produce the targeted devices. Tri-block copolymers (TBCs), consisting of an inner rigid semiconducting poly-diketo-pyrrolopyrrole-thienothiophene (PDPP-TT) block flanked by two soft elastomeric poly(dimethylsiloxane) (PDMS) chains, maintain good charge transport properties, while being mechanically soft and flexible. Potentially aiming at the fabrication of TBC-based wearable electronics by means of cost-efficient and scalable deposition methods (e.g., blade-coating), a tolerance of the electrical performance of the TBCs to the shear speed was investigated. Herein, we demonstrate that such TBCs can be deposited at high shear speeds (film formation up to a speed of 10 mm s<sup>−1</sup>). While such high speeds result in increased film thickness, no degradation of the electrical performance was observed, as was frequently reported for polymer−based OFETs. Instead, high shear speeds even led to a small improvement in the electrical performance: mobility increased from 0.06 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 0.5 mm s<sup>−1</sup> to 0.16 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 7 mm s<sup>−1</sup> for the TBC with 24 wt% PDMS, and for the TBC containing 37 wt% PDMS from 0.05 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 0.5 mm s<sup>−1 </sup>to 0.13 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 7 mm s<sup>−1</sup>. Interestingly, the improvement of mobility is not accompanied by any significant changes in morphology.https://www.mdpi.com/2073-4360/13/9/1435block copolymersorganic field-effect transistorsshear coatingshear speedthickness-dependent mobility
collection DOAJ
language English
format Article
sources DOAJ
author Kristina Ditte
Nataliya Kiriy
Jonathan Perez
Mike Hambsch
Stefan C. B. Mannsfeld
Yulia Krupskaya
Ramesh Maragani
Brigitte Voit
Franziska Lissel
spellingShingle Kristina Ditte
Nataliya Kiriy
Jonathan Perez
Mike Hambsch
Stefan C. B. Mannsfeld
Yulia Krupskaya
Ramesh Maragani
Brigitte Voit
Franziska Lissel
Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
Polymers
block copolymers
organic field-effect transistors
shear coating
shear speed
thickness-dependent mobility
author_facet Kristina Ditte
Nataliya Kiriy
Jonathan Perez
Mike Hambsch
Stefan C. B. Mannsfeld
Yulia Krupskaya
Ramesh Maragani
Brigitte Voit
Franziska Lissel
author_sort Kristina Ditte
title Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
title_short Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
title_full Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
title_fullStr Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
title_full_unstemmed Charge Carrier Mobility Improvement in Diketopyrrolopyrrole Block-Copolymers by Shear Coating
title_sort charge carrier mobility improvement in diketopyrrolopyrrole block-copolymers by shear coating
publisher MDPI AG
series Polymers
issn 2073-4360
publishDate 2021-04-01
description Shear coating is a promising deposition method for upscaling device fabrication and enabling high throughput, and is furthermore suitable for translating to roll-to-roll processing. Although common polymer semiconductors (PSCs) are solution processible, they are still prone to mechanical failure upon stretching, limiting applications in e.g., electronic skin and health monitoring. Progress made towards mechanically compliant PSCs, e.g., the incorporation of soft segments into the polymer backbone, could not only allow such applications, but also benefit advanced fabrication methods, like roll-to-roll printing on flexible substrates, to produce the targeted devices. Tri-block copolymers (TBCs), consisting of an inner rigid semiconducting poly-diketo-pyrrolopyrrole-thienothiophene (PDPP-TT) block flanked by two soft elastomeric poly(dimethylsiloxane) (PDMS) chains, maintain good charge transport properties, while being mechanically soft and flexible. Potentially aiming at the fabrication of TBC-based wearable electronics by means of cost-efficient and scalable deposition methods (e.g., blade-coating), a tolerance of the electrical performance of the TBCs to the shear speed was investigated. Herein, we demonstrate that such TBCs can be deposited at high shear speeds (film formation up to a speed of 10 mm s<sup>−1</sup>). While such high speeds result in increased film thickness, no degradation of the electrical performance was observed, as was frequently reported for polymer−based OFETs. Instead, high shear speeds even led to a small improvement in the electrical performance: mobility increased from 0.06 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 0.5 mm s<sup>−1</sup> to 0.16 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 7 mm s<sup>−1</sup> for the TBC with 24 wt% PDMS, and for the TBC containing 37 wt% PDMS from 0.05 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 0.5 mm s<sup>−1 </sup>to 0.13 cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup> at 7 mm s<sup>−1</sup>. Interestingly, the improvement of mobility is not accompanied by any significant changes in morphology.
topic block copolymers
organic field-effect transistors
shear coating
shear speed
thickness-dependent mobility
url https://www.mdpi.com/2073-4360/13/9/1435
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