Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix “Cryo” is used here for cryogenic). Under cryogenic conditions, the...

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Bibliographic Details
Main Authors:	José María De Teresa, Pablo Orús, Rosa Córdoba, Patrick Philipp
Format:	Article
Language:	English
Published:	MDPI AG 2019-11-01
Series:	Micromachines
Subjects:	focused ion beam focused electron beam-induced deposition focused ion beam-induced deposition lithography circuit edit electrical contacts thin films nanowires
Online Access:	https://www.mdpi.com/2072-666X/10/12/799

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