The Implementation of a Smart Sampling Scheme C2O Utilizing Virtual Metrology in Semiconductor Manufacturing

The Implementation of a Smart Sampling Scheme C2O Utilizing Virtual Metrology in Semiconductor Manufacturing

Virtual metrology (VM) is an enabling technology capable of performing virtual inspection on the metrology quality of wafers. Instead of physically acquiring the metrology measurements, VM applies conjecture models on the process data of wafers to estimate the measurements of the targeted metrology...

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Bibliographic Details
Main Authors: Tze Chiang Tin, Saw Chin Tan, Hing Yong, Jimmy Ook Hyun Kim, Eric Ken Yong Teo, Joanne Ching Yee Wong, Ching Kwang Lee, Peter Than, Angela Pei San Tan, Siew Chee Phang
Format: Article
Language:English
Published: IEEE 2021-01-01
Series:IEEE Access
Subjects:
Virtual metrology
overlay
classification
regression
data mining
smart sampling
Online Access:https://ieeexplore.ieee.org/document/9508983/

Internet

https://ieeexplore.ieee.org/document/9508983/

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