Tantalum/ Nitrogen and n-type WO3 semiconductor/FTO structures as a cathode for the future of nano devices
In the last decades an important number of research papers published on nano chip electrode and cathode electrochromic materials. Tantalum (Ta) with so high melting point can be as a good candidate for the future of nano chip devices. However, its surface has not enough trap centers and/or occupatio...
Main Authors: | Siamk Hoseinzadeh, Amir Hoshang Ramezani |
---|---|
Format: | Article |
Language: | English |
Published: |
Nanoscience and Nanotechnology Research Center, University of Kashan
2019-04-01
|
Series: | Journal of Nanostructures |
Subjects: | |
Online Access: | http://jns.kashanu.ac.ir/article_88809_eeccd200502107ec7bccb7377f3f74ce.pdf |
Similar Items
-
Hydrogen embrittlement of tantalum and tantalum coatings
by: Pokorný P., et al.
Published: (2012-07-01) -
Micro/Nano Structural Tantalum Coating for Enhanced Osteogenic Differentiation of Human Bone Marrow Stem Cells
by: Ding Ding, et al.
Published: (2018-04-01) -
Improvement of biohistological response of facial implant materials by tantalum surface treatment
by: Mohammed Mousa Bakri, et al.
Published: (2019-11-01) -
THE WORLD PRODUCTION OF TANTALUM (REVIEW)
by: D. K. Omarova
Published: (2012-02-01) -
Cathodic stripping voltammetric determination of chromium in coastal waters on cubic Nano-titanium carbide loaded gold nanoparticles modified electrode
by: Haitao eHan, et al.
Published: (2015-09-01)