Control of plasma profile in microwave discharges via inverse-problem approach
In the manufacturing process of semiconductors, plasma processing is an essential technology, and the plasma used in the process is required to be of high density, low temperature, large diameter, and high uniformity. This research focuses on the microwave-excited plasma that meets these needs, and...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2013-12-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4840735 |