Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization
Owing to their excellent properties, such as transparency, resistance to oxidation, and high adhesivity, acrylic pressure-sensitive adhesives (PSAs) are widely used. Recently, solvent-free acrylic PSAs, which are typically prepared via photopolymerization, have attracted increasing attention because...
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doaj-1441786aaa7f433a8e0925340bb44ae42021-01-14T00:02:33ZengMDPI AGMolecules1420-30492021-01-012638538510.3390/molecules26020385Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical PolymerizationJong-Ho Back0Yonghwan Kwon1Hyun-Joong Kim2Youngchang Yu3Wonjoo Lee4Min Sang Kwon5Center for Advanced Specialty Chemicals, Korea Research Institute of Chemical Technology, Ulsan 44412, KoreaDepartment of Materials Science and Engineering, Seoul National University, Seoul 08826, KoreaDepartment of Agriculture, Forestry and Bioresources, Research Institute of Agriculture and Life Sciences, College of Agriculture and Life Science, Seoul National University, Seoul 08826, KoreaCenter for Advanced Specialty Chemicals, Korea Research Institute of Chemical Technology, Ulsan 44412, KoreaCenter for Advanced Specialty Chemicals, Korea Research Institute of Chemical Technology, Ulsan 44412, KoreaDepartment of Materials Science and Engineering, Seoul National University, Seoul 08826, KoreaOwing to their excellent properties, such as transparency, resistance to oxidation, and high adhesivity, acrylic pressure-sensitive adhesives (PSAs) are widely used. Recently, solvent-free acrylic PSAs, which are typically prepared via photopolymerization, have attracted increasing attention because of the current strict environmental regulations. UV light is commonly used as an excitation source for photopolymerization, whereas visible light, which is safer for humans, is rarely utilized. In this study, we prepared solvent-free acrylic PSAs via visible light-driven photoredox-mediated radical polymerization. Three α-haloesters were used as additives to overcome critical shortcomings, such as the previously reported low film curing rate and poor transparency observed during additive-free photocatalytic polymerization. The film curing rate was greatly increased in the presence of α-haloesters, which lowered the photocatalyst loadings and, hence, improved the film transparency. These results confirmed that our method could be widely used to prepare general-purpose solvent-free PSAs—in particular, optically clear adhesives for electronics.https://www.mdpi.com/1420-3049/26/2/385acrylic pressure-sensitive adhesivevisible-light curingphotocatalysisα-haloester |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Jong-Ho Back Yonghwan Kwon Hyun-Joong Kim Youngchang Yu Wonjoo Lee Min Sang Kwon |
spellingShingle |
Jong-Ho Back Yonghwan Kwon Hyun-Joong Kim Youngchang Yu Wonjoo Lee Min Sang Kwon Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization Molecules acrylic pressure-sensitive adhesive visible-light curing photocatalysis α-haloester |
author_facet |
Jong-Ho Back Yonghwan Kwon Hyun-Joong Kim Youngchang Yu Wonjoo Lee Min Sang Kwon |
author_sort |
Jong-Ho Back |
title |
Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization |
title_short |
Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization |
title_full |
Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization |
title_fullStr |
Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization |
title_full_unstemmed |
Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization |
title_sort |
visible-light-curable solvent-free acrylic pressure-sensitive adhesives via photoredox-mediated radical polymerization |
publisher |
MDPI AG |
series |
Molecules |
issn |
1420-3049 |
publishDate |
2021-01-01 |
description |
Owing to their excellent properties, such as transparency, resistance to oxidation, and high adhesivity, acrylic pressure-sensitive adhesives (PSAs) are widely used. Recently, solvent-free acrylic PSAs, which are typically prepared via photopolymerization, have attracted increasing attention because of the current strict environmental regulations. UV light is commonly used as an excitation source for photopolymerization, whereas visible light, which is safer for humans, is rarely utilized. In this study, we prepared solvent-free acrylic PSAs via visible light-driven photoredox-mediated radical polymerization. Three α-haloesters were used as additives to overcome critical shortcomings, such as the previously reported low film curing rate and poor transparency observed during additive-free photocatalytic polymerization. The film curing rate was greatly increased in the presence of α-haloesters, which lowered the photocatalyst loadings and, hence, improved the film transparency. These results confirmed that our method could be widely used to prepare general-purpose solvent-free PSAs—in particular, optically clear adhesives for electronics. |
topic |
acrylic pressure-sensitive adhesive visible-light curing photocatalysis α-haloester |
url |
https://www.mdpi.com/1420-3049/26/2/385 |
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