Conductivity change of defective graphene by helium ion beams

Applying a recently developed helium ion microscope, we demonstrated direct nano-patterning and Anderson localization of single-layer graphene (SLG) on SiO2/Si substrates. In this study, we clarified the spatial-resolution-limitation factor of direct nano-patterning of SLG. Analysis of scanning capa...

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Bibliographic Details
Main Authors: Yuichi Naitou, Shinichi Ogawa
Format: Article
Language:English
Published: AIP Publishing LLC 2017-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4979983
Description
Summary:Applying a recently developed helium ion microscope, we demonstrated direct nano-patterning and Anderson localization of single-layer graphene (SLG) on SiO2/Si substrates. In this study, we clarified the spatial-resolution-limitation factor of direct nano-patterning of SLG. Analysis of scanning capacitance microscopy measurements reveals that the conductivity of helium ion (H+)-irradiated SLG nanostructures depends on their geometrical size, i.e., the smaller the H+-irradiated SLG region, the higher its conductivity becomes. This finding can be explained by the hopping carrier transport across strongly localized states of defective SLG.
ISSN:2158-3226