Influence of purge, time of waiting and TiCl<sub>4</sub> dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO<sub>2</sub> layer

Influence of purge, time of waiting and TiCl<sub>4</sub> dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO<sub>2</sub> layer

The aim of the study was to evaluate the influence of the ALD process parameters on mechanical properties and corrosion resistance of TiO<sub>2</sub> layer. The TiO<sub>2</sub> layer was deposited on stainless steel surfaces at constant temperature T = 200 °C and number of cy...

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Bibliographic Details
Main Authors: W. Walke, M. Kaczmarek, M. Staszuk, M. Basiaga
Format: Article
Language:English
Published: Croatian Metallurgical Society 2017-01-01
Series:Metalurgija
Subjects:
316LVM
TiO<sub>2</sub>
ALD method
electrochemical properties
mechanical properties
Online Access:http://hrcak.srce.hr/file/249317

Internet

http://hrcak.srce.hr/file/249317

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