The At-Wavelength Metrology Facility at BESSY-II

The At-Wavelength Metrology Facility at BESSY-II

The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer...

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Main Authors: Franz Schäfers, Andrey Sokolov
Format: Article
Language:English
Published: Forschungszentrum Jülich 2016-02-01
Series:Journal of large-scale research facilities JLSRF
Online Access:http://jlsrf.org/index.php/lsf/article/view/72
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spelling doaj-0d3fbc8046874b05b750fa1c37e97e612020-11-24T22:31:32ZengForschungszentrum JülichJournal of large-scale research facilities JLSRF 2364-091X2016-02-012A5010.17815/jlsrf-2-7267The At-Wavelength Metrology Facility at BESSY-IIFranz Schäfers0Andrey Sokolov1Helmholtz-Zentrum Berlin für Materialien und EnergieHelmholtz-Zentrum Berlin für Materialien und EnergieThe At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM) equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.http://jlsrf.org/index.php/lsf/article/view/72
collection DOAJ
language English
format Article
sources DOAJ
author Franz Schäfers
Andrey Sokolov
spellingShingle Franz Schäfers
Andrey Sokolov
The At-Wavelength Metrology Facility at BESSY-II
Journal of large-scale research facilities JLSRF
author_facet Franz Schäfers
Andrey Sokolov
author_sort Franz Schäfers
title The At-Wavelength Metrology Facility at BESSY-II
title_short The At-Wavelength Metrology Facility at BESSY-II
title_full The At-Wavelength Metrology Facility at BESSY-II
title_fullStr The At-Wavelength Metrology Facility at BESSY-II
title_full_unstemmed The At-Wavelength Metrology Facility at BESSY-II
title_sort at-wavelength metrology facility at bessy-ii
publisher Forschungszentrum Jülich
series Journal of large-scale research facilities JLSRF
issn 2364-091X
publishDate 2016-02-01
description The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM) equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.
url http://jlsrf.org/index.php/lsf/article/view/72
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AT andreysokolov theatwavelengthmetrologyfacilityatbessyii
AT franzschafers atwavelengthmetrologyfacilityatbessyii
AT andreysokolov atwavelengthmetrologyfacilityatbessyii
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