Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE proce...

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Bibliographic Details
Main Authors: Laixi Sun, Ting Shao, Zhaohua Shi, Jin Huang, Xin Ye, Xiaodong Jiang, Weidong Wu, Liming Yang, Wanguo Zheng
Format: Article
Language:English
Published: MDPI AG 2018-04-01
Series:Materials
Subjects:
fused silica
contamination
reactive ion etching
laser damage
optical performance
Online Access:http://www.mdpi.com/1996-1944/11/4/577

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