Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process
The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE proce...
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MDPI AG
2018-04-01
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| Series: | Materials |
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| Online Access: | http://www.mdpi.com/1996-1944/11/4/577 |
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doaj-0d332e39a28f438ca8383b5cc1ea6a072020-11-25T01:10:31ZengMDPI AGMaterials1996-19442018-04-0111457710.3390/ma11040577ma11040577Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching ProcessLaixi Sun0Ting Shao1Zhaohua Shi2Jin Huang3Xin Ye4Xiaodong Jiang5Weidong Wu6Liming Yang7Wanguo Zheng8Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaScience and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaIFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, ChinaResearch Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaIFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, ChinaThe reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique.http://www.mdpi.com/1996-1944/11/4/577fused silicacontaminationreactive ion etchinglaser damageoptical performance |
| collection |
DOAJ |
| language |
English |
| format |
Article |
| sources |
DOAJ |
| author |
Laixi Sun Ting Shao Zhaohua Shi Jin Huang Xin Ye Xiaodong Jiang Weidong Wu Liming Yang Wanguo Zheng |
| spellingShingle |
Laixi Sun Ting Shao Zhaohua Shi Jin Huang Xin Ye Xiaodong Jiang Weidong Wu Liming Yang Wanguo Zheng Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process Materials fused silica contamination reactive ion etching laser damage optical performance |
| author_facet |
Laixi Sun Ting Shao Zhaohua Shi Jin Huang Xin Ye Xiaodong Jiang Weidong Wu Liming Yang Wanguo Zheng |
| author_sort |
Laixi Sun |
| title |
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process |
| title_short |
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process |
| title_full |
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process |
| title_fullStr |
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process |
| title_full_unstemmed |
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process |
| title_sort |
ultraviolet laser damage dependence on contamination concentration in fused silica optics during reactive ion etching process |
| publisher |
MDPI AG |
| series |
Materials |
| issn |
1996-1944 |
| publishDate |
2018-04-01 |
| description |
The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique. |
| topic |
fused silica contamination reactive ion etching laser damage optical performance |
| url |
http://www.mdpi.com/1996-1944/11/4/577 |
| work_keys_str_mv |
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