Polarimetry of light scattered by surface roughness and textured films and periodic structures in nanotechnologies: a new challenge in instrumentation and modeling

• Main Author: Ferrieu. F.
• Format: Article
• Language: English
• Published: EDP Sciences 2010-06-01
• Series: EPJ Web of Conferences
• Online Access: http://dx.doi.org/10.1051/epjconf/20100504001

Exhaustive studies in the literature detail the Mueller matrices properties through decomposition, optical entropy and depolarization formalism. It has been applied for many years in rather different fields. In radar polarimetry, mathematical basis of depolarizing systems, have been first developed. In the visible range optics, standard diattenuation and retardance, decomposition is currently used in turbid organic media. The optical entropy concept, developed by S.R. Cloude, provides a very powerful analysis technique yielding important surface parameters such as depolarization, correlation and roughness. Complementary applications exist in scatterometry, for thin periodic grating films. With high capability polarimeters, such as the next generation of angle resolved polarimeters instruments, Polarimetry opens new fields of investigation for nanotechnologies materials as well as for gratings and photonics structures analysis: a program presently developed through a national consortium ANR08-NANO-020-03. With this instrumentation progress, simulation remains a key point to overpass as a challenge between future instruments. The theories for surfaces spectral power density (PSD) and the random coupled wave approximation (RCWA) in periodic structures are widely described in the literature. The implementation of some of these codes is described here for surface analysis and lithography scatterometry structures: grating overlay or double patterning.