A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer

A new materials group to implement dense wavelength division multiplexing (DWDM) in Si photonics is proposed. A large thermo-optic (TO) coefficient of Si malfunctions multiplexer/demultiplexer (MUX/DEMUX) on a chip under thermal fluctuation, and thus DWDM implementation, has been one of the most cha...

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Main Authors: Ziyi Zhang, Motoki Yako, Kan Ju, Naoyuki Kawai, Papichaya Chaisakul, Tai Tsuchizawa, Makoto Hikita, Koji Yamada, Yasuhiko Ishikawa, Kazumi Wada
Format: Article
Language:English
Published: Taylor & Francis Group 2017-12-01
Series:Science and Technology of Advanced Materials
Subjects:
Online Access:http://dx.doi.org/10.1080/14686996.2017.1301193
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spelling doaj-0b891afc86f547e4906146cd35352dc02020-11-24T21:53:38ZengTaylor & Francis GroupScience and Technology of Advanced Materials1468-69961878-55142017-12-0118128329310.1080/14686996.2017.13011931301193A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk waferZiyi Zhang0Motoki Yako1Kan Ju2Naoyuki Kawai3Papichaya Chaisakul4Tai Tsuchizawa5Makoto Hikita6Koji Yamada7Yasuhiko Ishikawa8Kazumi Wada9University of TokyoUniversity of TokyoUniversity of TokyoUniversity of TokyoUniversity of TokyoNippon Telegraph and Telephone CorporationNTT-Advanced TechnologyNippon Telegraph and Telephone CorporationUniversity of TokyoUniversity of TokyoA new materials group to implement dense wavelength division multiplexing (DWDM) in Si photonics is proposed. A large thermo-optic (TO) coefficient of Si malfunctions multiplexer/demultiplexer (MUX/DEMUX) on a chip under thermal fluctuation, and thus DWDM implementation, has been one of the most challenging targets in Si photonics. The present study specifies an optical materials group for DWDM by a systematic survey of their TO coefficients and refractive indices. The group is classified as mid-index contrast optics (MiDex) materials, and non-stoichiometric silicon nitride (SiNx) is chosen to demonstrate its significant thermal stability. The TO coefficient of non-stoichiometric SiNx is precisely measured in the temperature range 24–76 °C using the SiNx rings prepared by two methods: chemical vapor deposition (CVD) and physical vapor deposition (PVD). The CVD-SiNx ring reveals nearly the same TO coefficient reported for stoichiometric CVD-Si3N4, while the value for the PVD-SiNx ring is slightly higher. Both SiNx rings lock their resonance frequencies within 100 GHz in this temperature range. Since CVD-SiNx needs a high temperature annealing to reduce N–H bond absorption, it is concluded that PVD-SiNx is suited as a MiDex material introduced in the CMOS back-end-of-line. Further stabilization is required, considering the crosstalk between two channels; a ‘silicone’ polymer is employed to compensate for the temperature fluctuation using its negative TO coefficient, called athermalization. This demonstrates that the resonance of these SiNx rings is locked within 50 GHz at the same temperature range in the wavelength range 1460–1620 nm (the so-called S, C, and L bands in optical fiber communication networks). A further survey on the MiDex materials strongly suggests that Al2O3, Ga2O3 Ta2O5, HfO2 and their alloys should provide even more stable platforms for DWDM implementation in MiDex photonics. It is discussed that the MiDex photonics will find various applications such as medical and environmental sensing and in-vehicle data-communication.http://dx.doi.org/10.1080/14686996.2017.1301193Integrated opticsintegrated photonicsSi photonicsWDM on a chipmid-index contract optics
collection DOAJ
language English
format Article
sources DOAJ
author Ziyi Zhang
Motoki Yako
Kan Ju
Naoyuki Kawai
Papichaya Chaisakul
Tai Tsuchizawa
Makoto Hikita
Koji Yamada
Yasuhiko Ishikawa
Kazumi Wada
spellingShingle Ziyi Zhang
Motoki Yako
Kan Ju
Naoyuki Kawai
Papichaya Chaisakul
Tai Tsuchizawa
Makoto Hikita
Koji Yamada
Yasuhiko Ishikawa
Kazumi Wada
A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
Science and Technology of Advanced Materials
Integrated optics
integrated photonics
Si photonics
WDM on a chip
mid-index contract optics
author_facet Ziyi Zhang
Motoki Yako
Kan Ju
Naoyuki Kawai
Papichaya Chaisakul
Tai Tsuchizawa
Makoto Hikita
Koji Yamada
Yasuhiko Ishikawa
Kazumi Wada
author_sort Ziyi Zhang
title A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
title_short A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
title_full A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
title_fullStr A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
title_full_unstemmed A new material platform of Si photonics for implementing architecture of dense wavelength division multiplexing on Si bulk wafer
title_sort new material platform of si photonics for implementing architecture of dense wavelength division multiplexing on si bulk wafer
publisher Taylor & Francis Group
series Science and Technology of Advanced Materials
issn 1468-6996
1878-5514
publishDate 2017-12-01
description A new materials group to implement dense wavelength division multiplexing (DWDM) in Si photonics is proposed. A large thermo-optic (TO) coefficient of Si malfunctions multiplexer/demultiplexer (MUX/DEMUX) on a chip under thermal fluctuation, and thus DWDM implementation, has been one of the most challenging targets in Si photonics. The present study specifies an optical materials group for DWDM by a systematic survey of their TO coefficients and refractive indices. The group is classified as mid-index contrast optics (MiDex) materials, and non-stoichiometric silicon nitride (SiNx) is chosen to demonstrate its significant thermal stability. The TO coefficient of non-stoichiometric SiNx is precisely measured in the temperature range 24–76 °C using the SiNx rings prepared by two methods: chemical vapor deposition (CVD) and physical vapor deposition (PVD). The CVD-SiNx ring reveals nearly the same TO coefficient reported for stoichiometric CVD-Si3N4, while the value for the PVD-SiNx ring is slightly higher. Both SiNx rings lock their resonance frequencies within 100 GHz in this temperature range. Since CVD-SiNx needs a high temperature annealing to reduce N–H bond absorption, it is concluded that PVD-SiNx is suited as a MiDex material introduced in the CMOS back-end-of-line. Further stabilization is required, considering the crosstalk between two channels; a ‘silicone’ polymer is employed to compensate for the temperature fluctuation using its negative TO coefficient, called athermalization. This demonstrates that the resonance of these SiNx rings is locked within 50 GHz at the same temperature range in the wavelength range 1460–1620 nm (the so-called S, C, and L bands in optical fiber communication networks). A further survey on the MiDex materials strongly suggests that Al2O3, Ga2O3 Ta2O5, HfO2 and their alloys should provide even more stable platforms for DWDM implementation in MiDex photonics. It is discussed that the MiDex photonics will find various applications such as medical and environmental sensing and in-vehicle data-communication.
topic Integrated optics
integrated photonics
Si photonics
WDM on a chip
mid-index contract optics
url http://dx.doi.org/10.1080/14686996.2017.1301193
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