Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering
Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investi...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-07-01
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Series: | Coatings |
Subjects: | |
Online Access: | http://www.mdpi.com/2079-6412/8/8/263 |
Summary: | Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa. |
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ISSN: | 2079-6412 |