Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering

Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investi...

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Bibliographic Details
Main Authors: Li-Chun Chang, Yu-Zhe Zheng, Yung-I Chen
Format: Article
Language:English
Published: MDPI AG 2018-07-01
Series:Coatings
Subjects:
Online Access:http://www.mdpi.com/2079-6412/8/8/263
Description
Summary:Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.
ISSN:2079-6412