Atomic Layer-Deposited Al-Doped ZnO Thin Films for Display Applications

• Main Authors: Dimitre Dimitrov, Che-Liang Tsai, Stefan Petrov, Vera Marinova, Dimitrina Petrova, Blagovest Napoleonov, Blagoy Blagoev, Velichka Strijkova, Ken Yuh Hsu, Shiuan Huei Lin
• Format: Article
• Language: English
• Published: MDPI AG 2020-05-01
• Series: Coatings
• Subjects: Al-doped ZnO; ALD technique; transparent conductive layers; LC display; flexible PDLC devices
• Online Access: https://www.mdpi.com/2079-6412/10/6/539
• ISSN: 2079-6412

The integration of high uniformity, conformal and compact transparent conductive layers into next generation indium tin oxide (ITO)-free optoelectronics, including wearable and bendable structures, is a huge challenge. In this study, we demonstrate the transparent and conductive functionality of aluminum-doped zinc oxide (AZO) thin films deposited on glass as well as on polyethylene terephthalate (PET) flexible substrates by using an atomic layer deposition (ALD) technique. AZO thin films possess high optical transmittance at visible and near-infrared spectral range and electrical properties competitive to commercial ITO layers. AZO layers deposited on flexible PET substrates demonstrate stable sheet resistance over 1000 bending cycles. Based on the performed optical and electrical characterizations, several applications of ALD AZO as transparent conductive layers are shown—AZO/glass-supported liquid crystal (LC) display and AZO/PET-based flexible polymer-dispersed liquid crystal (PDLC) devices.