Self-assembly of silicon nanowires studied by advanced transmission electron microscopy

Scanning transmission electron microscopy (STEM) was successfully applied to the analysis of silicon nanowires (SiNWs) that were self-assembled during an inductively coupled plasma (ICP) process. The ICP-synthesized SiNWs were found to present a Si–SiO2 core–shell structure and length varying from ≈...

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Main Authors: Marta Agati, Guillaume Amiard, Vincent Le Borgne, Paola Castrucci, Richard Dolbec, Maurizio De Crescenzi, My Alì El Khakani, Simona Boninelli
Format: Article
Language:English
Published: Beilstein-Institut 2017-02-01
Series:Beilstein Journal of Nanotechnology
Subjects:
Online Access:https://doi.org/10.3762/bjnano.8.47
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spelling doaj-064bce0e85064ee986808be9b950164a2020-11-25T01:00:11ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862017-02-018144044510.3762/bjnano.8.472190-4286-8-47Self-assembly of silicon nanowires studied by advanced transmission electron microscopyMarta Agati0Guillaume Amiard1Vincent Le Borgne2Paola Castrucci3Richard Dolbec4Maurizio De Crescenzi5My Alì El Khakani6Simona Boninelli7Dipartimento di Fisica e Astronomia, Università di Catania, Via S. Sofia 64, Catania 95123, ItalyCNR IMM-MATIS, Via S. Sofia 64, Catania 95123, ItalyInstitut national de la recherche scientifique, Centre-Énergie, Matériaux et Télécommunications (INRS-EMT), 1650 Blvd. Lionel Boulet, Varennes QC-J3X 1S2, CanadaDipartimento di Fisica, Università di Roma “Tor Vergata”, Via della Ricerca Scientifica 1, Roma 00133, Italy,Tekna Plasma Systems Inc., 2935 Industrial Blvd., Sherbrooke QC-J1L 2T9, CanadaDipartimento di Fisica, Università di Roma “Tor Vergata”, Via della Ricerca Scientifica 1, Roma 00133, Italy,Institut national de la recherche scientifique, Centre-Énergie, Matériaux et Télécommunications (INRS-EMT), 1650 Blvd. Lionel Boulet, Varennes QC-J3X 1S2, CanadaCNR IMM-MATIS, Via S. Sofia 64, Catania 95123, ItalyScanning transmission electron microscopy (STEM) was successfully applied to the analysis of silicon nanowires (SiNWs) that were self-assembled during an inductively coupled plasma (ICP) process. The ICP-synthesized SiNWs were found to present a Si–SiO2 core–shell structure and length varying from ≈100 nm to 2–3 μm. The shorter SiNWs (maximum length ≈300 nm) were generally found to possess a nanoparticle at their tip. STEM energy dispersive X-ray (EDX) spectroscopy combined with electron tomography performed on these nanostructures revealed that they contain iron, clearly demonstrating that the short ICP-synthesized SiNWs grew via an iron-catalyzed vapor–liquid–solid (VLS) mechanism within the plasma reactor. Both the STEM tomography and STEM-EDX analysis contributed to gain further insight into the self-assembly process. In the long-term, this approach might be used to optimize the synthesis of VLS-grown SiNWs via ICP as a competitive technique to the well-established bottom-up approaches used for the production of thin SiNWs.https://doi.org/10.3762/bjnano.8.47silicon nanowirestransmission electron microscopyvapor–liquid–solid growth
collection DOAJ
language English
format Article
sources DOAJ
author Marta Agati
Guillaume Amiard
Vincent Le Borgne
Paola Castrucci
Richard Dolbec
Maurizio De Crescenzi
My Alì El Khakani
Simona Boninelli
spellingShingle Marta Agati
Guillaume Amiard
Vincent Le Borgne
Paola Castrucci
Richard Dolbec
Maurizio De Crescenzi
My Alì El Khakani
Simona Boninelli
Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
Beilstein Journal of Nanotechnology
silicon nanowires
transmission electron microscopy
vapor–liquid–solid growth
author_facet Marta Agati
Guillaume Amiard
Vincent Le Borgne
Paola Castrucci
Richard Dolbec
Maurizio De Crescenzi
My Alì El Khakani
Simona Boninelli
author_sort Marta Agati
title Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
title_short Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
title_full Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
title_fullStr Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
title_full_unstemmed Self-assembly of silicon nanowires studied by advanced transmission electron microscopy
title_sort self-assembly of silicon nanowires studied by advanced transmission electron microscopy
publisher Beilstein-Institut
series Beilstein Journal of Nanotechnology
issn 2190-4286
publishDate 2017-02-01
description Scanning transmission electron microscopy (STEM) was successfully applied to the analysis of silicon nanowires (SiNWs) that were self-assembled during an inductively coupled plasma (ICP) process. The ICP-synthesized SiNWs were found to present a Si–SiO2 core–shell structure and length varying from ≈100 nm to 2–3 μm. The shorter SiNWs (maximum length ≈300 nm) were generally found to possess a nanoparticle at their tip. STEM energy dispersive X-ray (EDX) spectroscopy combined with electron tomography performed on these nanostructures revealed that they contain iron, clearly demonstrating that the short ICP-synthesized SiNWs grew via an iron-catalyzed vapor–liquid–solid (VLS) mechanism within the plasma reactor. Both the STEM tomography and STEM-EDX analysis contributed to gain further insight into the self-assembly process. In the long-term, this approach might be used to optimize the synthesis of VLS-grown SiNWs via ICP as a competitive technique to the well-established bottom-up approaches used for the production of thin SiNWs.
topic silicon nanowires
transmission electron microscopy
vapor–liquid–solid growth
url https://doi.org/10.3762/bjnano.8.47
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