Exposure of AlN and Al2O3 to low energy D and He plasmas

Aluminum nitride (AlN) and aluminum oxide (Al2O3) were exposed to deuterium (D) and helium (He) plasma in the PISCES-A linear plasma device using RF biasing of the sample manipulator to set the incident ion energy (16–100 eV, 0.7–12 × 1025 m−2, <600 K). Preferential sputtering of nitrogen was det...

Full description

Bibliographic Details
Main Authors:	M.I. Patino, R.P. Doerner, G.R. Tynan
Format:	Article
Language:	English
Published:	Elsevier 2020-05-01
Series:	Nuclear Materials and Energy
Subjects:	Aluminum nitride Aluminum oxide Deuterium Helium Preferential sputtering
Online Access:	http://www.sciencedirect.com/science/article/pii/S2352179120300296

id	doaj-060d757fe51245f0bd61dcb9077b7f87
record_format	Article
spelling	doaj-060d757fe51245f0bd61dcb9077b7f872020-11-25T02:39:15ZengElsevierNuclear Materials and Energy2352-17912020-05-0123Exposure of AlN and Al2O3 to low energy D and He plasmasM.I. Patino0R.P. Doerner1G.R. Tynan2Corresponding author.; Center for Energy Research, University of California at San Diego, 9500 Gilman Dr., La Jolla, CA 92093-0417, USACenter for Energy Research, University of California at San Diego, 9500 Gilman Dr., La Jolla, CA 92093-0417, USACenter for Energy Research, University of California at San Diego, 9500 Gilman Dr., La Jolla, CA 92093-0417, USAAluminum nitride (AlN) and aluminum oxide (Al2O3) were exposed to deuterium (D) and helium (He) plasma in the PISCES-A linear plasma device using RF biasing of the sample manipulator to set the incident ion energy (16–100 eV, 0.7–12 × 1025 m−2, <600 K). Preferential sputtering of nitrogen was detected for D and He exposed AlN samples, resulting in Al enrichment at the surface (i.e., Al/N ~2–3). The Al-enriched region was limited to the uppermost ~20 nm, independent of fluence, and was eliminated by exposure to plasma seeded with nitrogen. No Al enrichment was observed for the Al2O3 samples exposed to pure D or He. Results suggest AlN and Al2O3 are promising candidates as plasma facing materials in magnetic fusion and RF plasma devices (e.g., as electrical standoffs and RF heating windows).http://www.sciencedirect.com/science/article/pii/S2352179120300296Aluminum nitrideAluminum oxideDeuteriumHeliumPreferential sputtering
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	M.I. Patino R.P. Doerner G.R. Tynan
spellingShingle	M.I. Patino R.P. Doerner G.R. Tynan Exposure of AlN and Al2O3 to low energy D and He plasmas Nuclear Materials and Energy Aluminum nitride Aluminum oxide Deuterium Helium Preferential sputtering
author_facet	M.I. Patino R.P. Doerner G.R. Tynan
author_sort	M.I. Patino
title	Exposure of AlN and Al2O3 to low energy D and He plasmas
title_short	Exposure of AlN and Al2O3 to low energy D and He plasmas
title_full	Exposure of AlN and Al2O3 to low energy D and He plasmas
title_fullStr	Exposure of AlN and Al2O3 to low energy D and He plasmas
title_full_unstemmed	Exposure of AlN and Al2O3 to low energy D and He plasmas
title_sort	exposure of aln and al2o3 to low energy d and he plasmas
publisher	Elsevier
series	Nuclear Materials and Energy
issn	2352-1791
publishDate	2020-05-01
description	Aluminum nitride (AlN) and aluminum oxide (Al2O3) were exposed to deuterium (D) and helium (He) plasma in the PISCES-A linear plasma device using RF biasing of the sample manipulator to set the incident ion energy (16–100 eV, 0.7–12 × 1025 m−2, <600 K). Preferential sputtering of nitrogen was detected for D and He exposed AlN samples, resulting in Al enrichment at the surface (i.e., Al/N ~2–3). The Al-enriched region was limited to the uppermost ~20 nm, independent of fluence, and was eliminated by exposure to plasma seeded with nitrogen. No Al enrichment was observed for the Al2O3 samples exposed to pure D or He. Results suggest AlN and Al2O3 are promising candidates as plasma facing materials in magnetic fusion and RF plasma devices (e.g., as electrical standoffs and RF heating windows).
topic	Aluminum nitride Aluminum oxide Deuterium Helium Preferential sputtering
url	http://www.sciencedirect.com/science/article/pii/S2352179120300296
work_keys_str_mv	AT mipatino exposureofalnandal2o3tolowenergydandheplasmas AT rpdoerner exposureofalnandal2o3tolowenergydandheplasmas AT grtynan exposureofalnandal2o3tolowenergydandheplasmas
_version_	1724787381513486336

Exposure of AlN and Al2O3 to low energy D and He plasmas

Similar Items