Removal of Fine Particles from Wafer Surface by Pulse Air Jets [Translated]†

Removal of Fine Particles from Wafer Surface by Pulse Air Jets [Translated]†

Removal of fine particles from wafer surface by air jets was experimentally investigated in order to seek an effective surface-cleaning method which uses no cleaning liquids. Monodisperse polystyrene latex particles with diameter between 0.25...

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Bibliographic Details
Main Authors:	Yoshio Otani, Hitoshi Emi, Tetsuya Morizane, Jisaku Mori
Format:	Article
Language:	English
Published:	Hosokawa Powder Technology Foundation 2014-05-01
Series:	KONA Powder and Particle Journal
Online Access:	https://www.jstage.jst.go.jp/article/kona/12/0/12_1994023/_pdf/-char/en

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