Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
Utilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W...
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2019-09-01
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Online Access: | https://doi.org/10.1038/s41467-019-12200-x |
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doaj-02705021ecec4a0f921a7924000cf0602021-05-11T11:51:26ZengNature Publishing GroupNature Communications2041-17232019-09-011011810.1038/s41467-019-12200-xRobust trap effect in transition metal dichalcogenides for advanced multifunctional devicesLei Yin0Peng He1Ruiqing Cheng2Feng Wang3Fengmei Wang4Zhenxing Wang5Yao Wen6Jun He7CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyUtilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W at 1550 nm and non-volatile memories with photo-switching ratio of 108.https://doi.org/10.1038/s41467-019-12200-x |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Lei Yin Peng He Ruiqing Cheng Feng Wang Fengmei Wang Zhenxing Wang Yao Wen Jun He |
spellingShingle |
Lei Yin Peng He Ruiqing Cheng Feng Wang Fengmei Wang Zhenxing Wang Yao Wen Jun He Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices Nature Communications |
author_facet |
Lei Yin Peng He Ruiqing Cheng Feng Wang Fengmei Wang Zhenxing Wang Yao Wen Jun He |
author_sort |
Lei Yin |
title |
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_short |
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_full |
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_fullStr |
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_full_unstemmed |
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
title_sort |
robust trap effect in transition metal dichalcogenides for advanced multifunctional devices |
publisher |
Nature Publishing Group |
series |
Nature Communications |
issn |
2041-1723 |
publishDate |
2019-09-01 |
description |
Utilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W at 1550 nm and non-volatile memories with photo-switching ratio of 108. |
url |
https://doi.org/10.1038/s41467-019-12200-x |
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