Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices

Utilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W...

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Main Authors: Lei Yin, Peng He, Ruiqing Cheng, Feng Wang, Fengmei Wang, Zhenxing Wang, Yao Wen, Jun He
Format: Article
Language:English
Published: Nature Publishing Group 2019-09-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-019-12200-x
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spelling doaj-02705021ecec4a0f921a7924000cf0602021-05-11T11:51:26ZengNature Publishing GroupNature Communications2041-17232019-09-011011810.1038/s41467-019-12200-xRobust trap effect in transition metal dichalcogenides for advanced multifunctional devicesLei Yin0Peng He1Ruiqing Cheng2Feng Wang3Fengmei Wang4Zhenxing Wang5Yao Wen6Jun He7CAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyCAS Center for Excellence in Nanoscience, CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and TechnologyUtilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W at 1550 nm and non-volatile memories with photo-switching ratio of 108.https://doi.org/10.1038/s41467-019-12200-x
collection DOAJ
language English
format Article
sources DOAJ
author Lei Yin
Peng He
Ruiqing Cheng
Feng Wang
Fengmei Wang
Zhenxing Wang
Yao Wen
Jun He
spellingShingle Lei Yin
Peng He
Ruiqing Cheng
Feng Wang
Fengmei Wang
Zhenxing Wang
Yao Wen
Jun He
Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
Nature Communications
author_facet Lei Yin
Peng He
Ruiqing Cheng
Feng Wang
Fengmei Wang
Zhenxing Wang
Yao Wen
Jun He
author_sort Lei Yin
title Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
title_short Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
title_full Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
title_fullStr Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
title_full_unstemmed Robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
title_sort robust trap effect in transition metal dichalcogenides for advanced multifunctional devices
publisher Nature Publishing Group
series Nature Communications
issn 2041-1723
publishDate 2019-09-01
description Utilization of inevitable defect states in 2D materials can enable efficient photodetection and memory applications. Here, the authors report use of defect-induced deep traps to capture and store carriers in exfoliated flakes of MoS2xSe2(1-x) as photodetectors with high responsivity of 2.4 × 105 A/W at 1550 nm and non-volatile memories with photo-switching ratio of 108.
url https://doi.org/10.1038/s41467-019-12200-x
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