Special Issue: 15 Years of SU8 as MEMS Material
In 1997, the first paper using SU-8 as a material for microfabrication was published [1], demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components.[...]
Main Authors: | Arnaud Bertsch, Philippe Renaud |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2015-06-01
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Series: | Micromachines |
Subjects: | |
Online Access: | http://www.mdpi.com/2072-666X/6/6/790 |
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