Scaling of Hall coefficient in Co-Bi granular thin films
A series of Co-Bi thin films with Co concentrations c=0, 0.05, 0.2, 0.26, 0.3, 0.333, 0.375, 0.545, were grown by magnetron sputtering on Si(100)/SiNX substrates. Resistivity measurements at zero field (ρxx) as a function of temperature-T exhibit an exponential variation with T in the region of 240K...
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2013-01-01
|
| Series: | EPJ Web of Conferences |
| Online Access: | http://dx.doi.org/10.1051/epjconf/20134012002 |
| id |
doaj-000f47fd1f9d4f19bdccbc4329ec49ab |
|---|---|
| record_format |
Article |
| spelling |
doaj-000f47fd1f9d4f19bdccbc4329ec49ab2021-08-02T09:43:37ZengEDP SciencesEPJ Web of Conferences2100-014X2013-01-01401200210.1051/epjconf/20134012002Scaling of Hall coefficient in Co-Bi granular thin filmsSpeliotis Th.Christides C.Athanasopoulos P.A series of Co-Bi thin films with Co concentrations c=0, 0.05, 0.2, 0.26, 0.3, 0.333, 0.375, 0.545, were grown by magnetron sputtering on Si(100)/SiNX substrates. Resistivity measurements at zero field (ρxx) as a function of temperature-T exhibit an exponential variation with T in the region of 240K<T<300K. The Hall coefficient as a function of Co concentration diverges as log|c-0.3|0.3 for c<0.333, indicating a scaling of RH nearby a percolation threshold pc=0.3. Only after proper scaling of the anomalous Hall coefficient RS the conventional RS∝(ρxx)n dependence can be satisfied.http://dx.doi.org/10.1051/epjconf/20134012002 |
| collection |
DOAJ |
| language |
English |
| format |
Article |
| sources |
DOAJ |
| author |
Speliotis Th. Christides C. Athanasopoulos P. |
| spellingShingle |
Speliotis Th. Christides C. Athanasopoulos P. Scaling of Hall coefficient in Co-Bi granular thin films EPJ Web of Conferences |
| author_facet |
Speliotis Th. Christides C. Athanasopoulos P. |
| author_sort |
Speliotis Th. |
| title |
Scaling of Hall coefficient in Co-Bi granular thin films |
| title_short |
Scaling of Hall coefficient in Co-Bi granular thin films |
| title_full |
Scaling of Hall coefficient in Co-Bi granular thin films |
| title_fullStr |
Scaling of Hall coefficient in Co-Bi granular thin films |
| title_full_unstemmed |
Scaling of Hall coefficient in Co-Bi granular thin films |
| title_sort |
scaling of hall coefficient in co-bi granular thin films |
| publisher |
EDP Sciences |
| series |
EPJ Web of Conferences |
| issn |
2100-014X |
| publishDate |
2013-01-01 |
| description |
A series of Co-Bi thin films with Co concentrations c=0, 0.05, 0.2, 0.26, 0.3, 0.333, 0.375, 0.545, were grown by magnetron sputtering on Si(100)/SiNX substrates. Resistivity measurements at zero field (ρxx) as a function of temperature-T exhibit an exponential variation with T in the region of 240K<T<300K. The Hall coefficient as a function of Co concentration diverges as log|c-0.3|0.3 for c<0.333, indicating a scaling of RH nearby a percolation threshold pc=0.3. Only after proper scaling of the anomalous Hall coefficient RS the conventional RS∝(ρxx)n dependence can be satisfied. |
| url |
http://dx.doi.org/10.1051/epjconf/20134012002 |
| work_keys_str_mv |
AT speliotisth scalingofhallcoefficientincobigranularthinfilms AT christidesc scalingofhallcoefficientincobigranularthinfilms AT athanasopoulosp scalingofhallcoefficientincobigranularthinfilms |
| _version_ |
1721234508536086528 |