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Grace. H. Ho
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Grace. H. Ho
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1
1. Absolute photoionization yields and ionization branching ratios of organic solvents studied by electron-impact and photo-impact methods in the 8 to 150 eV range2. Absorption and...
by
Yen-hsiang Huang
,
黃彥翔
Published 2013
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2
(1) Qualitative and quantitative outgassing from photoresist films upon DUV, VUV, EUV and BEUV irradiation(2) Absolute ionization branching ratios of aromatic compounds by electron...
by
Hung-Miao Lin
,
林虹妙
Published 2014
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Grace
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3
Qualitative and quantitative measurements and theoretical calculation on electron ionization of small molecules
by
Ching-Hong Fong
,
方景弘
Published 2017
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4
Photophysical and photochemical properties of photoresists and underlayer materials for extreme ultraviolet lithography upon irradiation at 13.5 nm
by
Fu-Hsiu Kang
,
康富修
Published 2010
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5
(1)Ionic outgassing of photoacid generators upon irradiation at 13.5 nm(2)Preparation and characterization of mesoporous carbon
by
Chih-jen Liu
,
劉智仁
Published 2009
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6
(1)Optical properties and photoablation of photosensitive thin films upon 13.5 and 6.7 nm irradiation(2)VIS-VUV photoabsorption of amino acids in the solid state
by
Chen Yu Yeh
,
葉宸佑
Published 2014
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7
(1) Ionic outgassing from underlayer materials and photoresist upon irradiation at 13.5 nm (2) Preparation and characterization of Al2O3-modified SiO2 mesoporous materials
by
Yu-Hsien Shih
,
施郁嫻
Published 2009
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