Radiation Tolerance and Charge Trapping Enhancement of ALD HfO₂/Al₂O₃ Nanolaminated Dielectrics

by Dencho Spassov, Albena Paskaleva, Elżbieta Guziewicz, Vojkan Davidović, Srboljub Stanković, Snežana Djorić-Veljković, Tzvetan Ivanov, Todor Stanchev, Ninoslav Stojadinović
Published 2021-02-01

Structural Properties of Thin ZnO Films Deposited by ALD under O-Rich and Zn-Rich Growth Conditions and Their Relationship with Electrical Parameters

by Sushma Mishra, Ewa Przezdziecka, Wojciech Wozniak, Abinash Adhikari, Rafal Jakiela, Wojciech Paszkowicz, Adrian Sulich, Monika Ozga, Krzysztof Kopalko, Elzbieta Guziewicz
Published 2021-07-01